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SIFCO ASC flies high with added seal of approval from NADCAP

SIFCO Applied Surface Concepts (ASC), a world leading supplier of selective plating technology and solutions, has achieved Nadcap(National Aerospace and Defence Contractors Accreditation Program) AC7108 Rev F accreditation for chemical processing for the aerospace sector at its Cleveland and Connecticut facilities.

SIFCO ASC's headquarters in Cleveland, Ohio and the East Windsor, Connecticut facility have now met the stringent requirements of the Nadcap accreditation, which allows them to be featured on the Qualified Manufacturers List (QML).

This Nadcap accreditation has been expanded to include testing in support of processes such as anodizing (not for metal bond), brush plating, and electroplating. This will give customers the opportunity to gain certified testing as required by industry specifications that fall under the supporting processes of AC7108 Rev F only.

Lee Shelton, Group Managing Director of SIFCO ASC, said “We are extremely pleased to have been awarded this accreditation from Nadcap, as it is recognised within the industry as a leading standard. To be awarded this title is testament to our dedication to continuing to develop as a business and offer our customers the very best in products and solutions.”

SIFCO ASC provides practical, cost-effective selective plating solutions to improve part performance and reduce manufacturing costs through corrosion protection, increased wear resistance, increased hardness, improved conductivity, anti-galling or slip. SIFCO ASC surface enhancement technologies and selective plating services have been utilised for more than 50 years on both OEM components and on parts requiring refurbishment in the aerospace, oil and gas, general industry and power generation sectors.

Press release issued by SIFCO Applied Surface Concepts on August 13, 2014


 Contact details from our directory:
SIFCO Applied Surface Concepts Brush Plating, Cadmium Plating, Electroplating


 Related directory sectors:
Surface Treatment

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